Major breakthrough in integrated circuit core R & D
Release date: 2020-01-09 10:07:14 Visits: 963
A major special project of the National 863 Plan integrated circuit manufacturing equipment "100nm high-density plasma etching machine and large-angle ion implanter" today passed the project acceptance organized by the Ministry of Science and Technology and Beijing in Beijing. This is the realization of the domestic mainstream integrated circuit core equipment products in China, marking a major breakthrough in the development of integrated circuit manufacturing core equipment in China, and a welcome step in independent innovation and industrialization in this field.
The integrated circuit equipment industry has become a typical representative of the high-tech equipment industry. The booming development of China''s integrated circuit manufacturing industry has brought huge market space for integrated circuit manufacturing equipment. According to forecasts, by 2010, China''s integrated circuit industry investment will total 350 billion yuan, most of which will be used for integrated circuit manufacturing equipment. investment. This trend makes the Chinese market the focus of competition in the global integrated circuit manufacturing equipment industry.
Facing the rapidly growing market, China''s integrated circuit manufacturing equipment manufacturing industry still has a large gap in terms of production scale, research and development level, investment intensity, and talent gathering, and an industrial scale that can support its sustainable development has not yet been formed. . This situation has led to the lack of core competitiveness and independent innovation capabilities in China, which has made China''s integrated circuit industry, especially equipment and other core technologies, constrained.
During the "Tenth Five-Year Plan" period, the 863 Plan set up a major project of "Integrated Circuit Manufacturing Equipment" to develop some core equipment for integrated circuit manufacturing equipment. The "100nm high-density plasma etching machine and large-angle ion implanter" organized and implemented by Beijing has completed product development and conducted nearly a year of inspection and inspection on large production lines. The assessment test results show that the equipment design parameters, hardware performance parameters, and basic technical parameters of domestic etching and injection machines have reached the international standards for similar production equipment.
